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Outline a procedure for photolithography in the fabrication of electronic devices. What are the limitations of this procedure?
Photolithography is the process of transferring geometric shapes on a mask to the Surface of semiconductor water. The steps includes in the photolithographic process are wafer cleaning; barrier layer formation; photo resist application; soft baking; mask alignment; exposure and development; and hard-baking.
Zinc has hcp structure. In a unit cell of zinc, the zinc atoms occupy 74% of volume of unit cell.
30,000 lb/hr of combination whose average properties correspond to hexane is vaporized from 40,000 lb/hr of feed at its bubble point at 105 psig. The boiling range is from 300 to 3
what is the heat capacity of Sodium lauryl sulfate
It is desired to concentrate a NaOH solution from 12.5 % to 40% in a double effect evaporator. 50,000 lb/hr of feed solution enters the evaporator at 120 o F, and steam at 15 psig
the pilling bedworth ratio of iron is 1.77 why it not stable as per rulr
Mixing Salt Solutions You mix 195.0 gallons of a mixture containing 12.00 wt% NaCl (sodium chloride) and 88.00 wt% water (solution density = 1.0837 g/cm 3 ) with a V 2 -gallon
Spelling resistance: The breaking or cracking or peeling off the refractory is known as spelling. A good refractory must show a good resistance to thermal spelling. Thermal spelli
why ,a substance is being heated at a fast rate the temperature of decomposition will be the higher than the obtain at a slower heating rate..
Significant class of magnetic materials The most significant class of magnetic materials is the Ferro magnets: iron, nickel, cobalt and manganese, or their compounds (and a
advantages of fuel cell over batteries
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