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Explain the various steps required in the fabrication of an integrated circuit.
Lithography: The method for pattern definition by applying thin uniform layer of viscous liquid (photo-resist) on the wafer surface.
Etching: Selectively deleting unwanted material from the surface of the wafer. The pattern of the photo-resist is transferred to the wafer by means of etching agents.
Deposition: Films of the several materials are applied on the wafer.
Chemical Polishing: A planarization method by applying chemical slurry with etchant agents to the wafer surface.
write merits and demerits of free radical mechanism
Objectives After you have done this exercise, you should be able to: 1. Prepare a comparative chart of quotations 2. fill up the quotations form 3. process a bill for
cristallinity of PVDF
Q. Define flash and fire points and its determination. OR Write short note on: Flash and fire points. Ans. Flash and fire points:
a. Explain the problems of flooding and channeling in packed towertion..
Production of Chemicals from Coal Coal has been considered a major component of U.S. energy reserves for a long time, and more recently it has become an important raw material
putting example of literature review
construction and working of calomel and Ag-AgCl electodes
Which one of the following statements about product A is correct? It arose from a reaction between chloride ion and a primary carbocation It arose from a reaction
prove that work is a path function
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