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Mask Alignment and Exposure
One of the most significant steps in the photolithography process is mask alignment. A mask or "photomask" is a square glass plate with a patterned emulsion of metal film on single side. The mask is aligned with the wafer, so that the pattern can be transfer onto the wafer surface. Every mask after the first one must be aligned to the last pattern.
Once the mask has been accurately allied with the pattern on the wafer's surface, the photo resist is exposed by the pattern on the mask with a high intensity ultraviolet light. There are three primary exposure methods: contact, proximity, and projection. They are shown in the figure below.
Consider the cascade loop as shown below: i) Specify the inner-loop gain such that the damping coefficient of the closed loop is equal to 0.4 ii) Derive the ultimate
a. Explain the problems of flooding and channeling in packed towertion..
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a mixture of propane (125 lbmole, K = 2.056), n-butane (200 lbmole, K = 0.925), and n-pentane (175 lbmole, K=0.520), is at 200 psia and 200 F. determine the phase of the mixture?
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What is Spheroidsing Spheroidsing is the method that applies more to the hypereutectoid steels (above 0,8% C). The process includes heating the metal to between 600oC and 65
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the frame in figure consisted of members AB and BCD connected by pin at B, and member AB is a quarter circle of radius 75mm. the whole frame is supported by pins at A and C. for th
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