Explain mask alignment and exposure, Chemical Engineering

Assignment Help:

Mask Alignment and Exposure

One of the most significant steps in the photolithography process is mask alignment. A mask or "photomask" is a square glass plate with a patterned emulsion of metal film on single side. The mask is aligned with the wafer, so that the pattern can be transfer onto the wafer surface. Every mask after the first one must be aligned to the last pattern.

Once the mask has been accurately allied with the pattern on the wafer's surface, the photo resist is exposed by the pattern on the mask with a high intensity ultraviolet light. There are three primary exposure methods: contact,  proximity, and projection. They are shown in the figure below.  

 

2123_Untitled.png


Related Discussions:- Explain mask alignment and exposure

Atmospheric carbon dioxide, Atmospheric carbon dioxide is thought to be res...

Atmospheric carbon dioxide is thought to be responsible for global warming. The table below contains data about the amount of Atmospheric CO 2 (in ppm) over the last fifty year

Calculate the flow rate of bread produced, Question:1 (a) A flowchart o...

Question:1 (a) A flowchart of a continuous steady state two-unit separation process is shown below (Figure 1.1). Each stream contains two components, x and y, in different prop

Online tuition, Can I have online tuition sessions for reaction engineering...

Can I have online tuition sessions for reaction engineering ?

Dynamic simulation, iwant to check first if you can write a report about pr...

iwant to check first if you can write a report about project that inovlves dynamic simulation before submitting my assignment.

Procedure-design and features of a laboratory, PROCEDURE : Visit any lab (...

PROCEDURE : Visit any lab (physics, chemistry or biology) of your study centre or any other you can get access to and note its features. To guide you through we have listed below

Design the manufacture of cellulose acetate, How to design a reaction vesse...

How to design a reaction vessel for esterification reaction

Calculate the fugacity of liquid acetone, Calculate the fugacity of liquid ...

Calculate the fugacity of liquid acetone at 110° C and 275 bar. At 110 0C the vapor pressure of acetone is 4.360 bar and the molar volume of saturated liquid acetone is 73 cm 3 /mo

Material and energy balances, Wet air containing 4.0 mole% water vapor at 7...

Wet air containing 4.0 mole% water vapor at 76°F and 14.8 psia is passed through a column of calcium chloride pellets. The pellets absorb 97% of the water and none of the other con

Work, prove that work is a path function

prove that work is a path function

Write Your Message!

Captcha
Free Assignment Quote

Assured A++ Grade

Get guaranteed satisfaction & time on delivery in every assignment order you paid with us! We ensure premium quality solution document along with free turntin report!

All rights reserved! Copyrights ©2019-2020 ExpertsMind IT Educational Pvt Ltd