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Mask Alignment and Exposure
One of the most significant steps in the photolithography process is mask alignment. A mask or "photomask" is a square glass plate with a patterned emulsion of metal film on single side. The mask is aligned with the wafer, so that the pattern can be transfer onto the wafer surface. Every mask after the first one must be aligned to the last pattern.
Once the mask has been accurately allied with the pattern on the wafer's surface, the photo resist is exposed by the pattern on the mask with a high intensity ultraviolet light. There are three primary exposure methods: contact, proximity, and projection. They are shown in the figure below.
Materials for AC applications These applications generally needs low coercivity Hc and low power loss, high permeability µ, high saturation magnetization. The low value of
Which one of the following statements is correct? You may wish to examine a molecular model of this compound. 1. Carbon G is an asymmetric center and its configuration is R 2
Distinguish between intrinsic and extrinsic semiconductor. In intrinsic semiconductors, the conduction is because of the intrinsic processes characteristics of the crystal, wit
how do you write a report about conductometric titration
Define Cohesive energy Cohesive energy can be described as the difference among the average energy of the atoms of a solid (especially a crystal) and that of the free atoms.
explain
In the dryer air furnace, a natural gas containing 92.5 mole% methane, 4.8% ethane, and the remainder propane is burned with 20% excess air. The fuel enters the furnace at 25°C and
Insulating material used in spark plug is porcelain
assignment
Explain Loss Angle Loss Angle can be described as the arc-tangent of the electrical dissipation factor.
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