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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
the frame in figure consisted of members AB and BCD connected by pin at B, and member AB is a quarter circle of radius 75mm. the whole frame is supported by pins at A and C. for th
a) List the dissimilar Heat transfer equipment involved in your plant. Also describe the governing principle or modes of heat transfer for every equipment that listed. Determine th
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An organic compound is found to contain 37.5% of C, 3.2% of H and 59.3% of F. The following pressure and volume data were obtained for 1.0g of this substance at 90 degrees celsius
1. Select a process variable (pressure / temperature / level / flow) and conduct a literature survey to determine recent developments in process instrumentation field. Ide
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explain physical and chemical methods of extraction in detail?
a. Describe the problems of flooding and channelling in packed tower b. Describe the construction and working of sieve tray, bubble cap tray and counter flow tray c. Describe
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