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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
what is rate constant
reaction of dry cells?
Daily routine of preparation for experiments/demonstration : In order to become familiar with the preparation that a lab staff member makes prior to an experiment/demonstration it
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equivalant weight ofmg(hco3)2
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