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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
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Question:1 (a) A flowchart of a continuous steady state two-unit separation process is shown below (Figure 1.1). Each stream contains two components, x and y, in different prop
Brazing and Soldering - Both soldering and brazing processes are useful for combination two dissimilar metals. Both brazing alloy and solder have lower melting points than the met
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Explain the Fermi energy The Fermi energy generally refers to the energy of the highest get quantum state in a system of fermions at absolute zero temperature.
Strawberries contain about 20 wt% solids and 80 wt% water. To make strawberry jam, crushed strawberries and sugar are mixed in a 40:60 mass ratio, and the mixture is heated to evap
the frame in figure consisted of members AB and BCD connected by pin at B, and member AB is a quarter circle of radius 75mm. the whole frame is supported by pins at A and C. for th
In a drying system, 600 m 3 /min of ambient air at 20° C and 50% relative humidity is heated to a temperature of 50°C before passing into the drying chamber. a) What are the spe
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