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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
Application of polymeric liquids in water distribution system
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In a drying system, 600 m 3 /min of ambient air at 20° C and 50% relative humidity is heated to a temperature of 50°C before passing into the drying chamber. a) What are the spe
Ask question #Minimum 100 words accepted`How Daniel cell works?
One cubic metre of wet soil weighs 19.80 kN. If the exact gravity of soil particles is 2.70 and water content is 11%, Determine the void ratio, dry density and degree of saturat
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Mask Alignment and Exposure One of the most significant steps in the photolithography process is mask alignment. A mask or "photomask" is a square glass plate with a patterned
Why protons doesn''t react which each other?
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