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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
merits and demerits of electrostatic sheilding.
Properties of filament and contact materials. The Filament materials must have low resistance temperature co-efficient, high melting point, high mechanical strength, ductility
Polarization of Dielectric If a material having polar molecules, they will usually be in random orientations when no electric field is applied. An applied electric field will p
resultant of two simple harmonic motion
Mass transfer coefficients can be of either local or overall type. a. Describe carefully what the local and overall mass move coefficients show. b. How does the concentration
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Ask question #Minimum 100 words accepted.hardness of bore water is less than that of sea water-justify
What are the functions of oxide layer in high quality IC? Explain. Silicon has the unique ability to be oxidized into silica, which makes a chemically stable, protective and i
What is Metallisation Metallisation : metalizing is the procedure of evaporating a film of metal onto products. Normally the same is done in vacuum, therefore called vacuum m
the process of hot lime soda process for softening of water in detail
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