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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
Soft-Baking Soft-baking is the step during which almost all of the solvents are separate from the photo resist coating. Soft-baking plays a very critical role in photo-imaging.
the pilling bedworth ratio of iron is 1.77 why it not stable as per rulr
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application of neutral refractory
Refractoriness: It indicates the capacity of a material to withstand heat without appreciable deformation or softening under particular operating conditions and is measured as the
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