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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
Positive and Negative Photo resist There are two types of photo resist: positive and negative. For positive resists, the resist is exposed with UV light where the underlying ma
For a substance explained by the van der Waals equation of state with a constant heat capacity CV : 1) Find the internal energy U(T, V ), relative to a reference state at some T
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Hi, my name is Luan Sousa, i am from Brazil and i am a chemical engineering student. I am developing a project of formox plant design and i would like to know about yields of conve
What is piezoelectricity? Piezoelectricity: Piezoelectricity gives us a means of changing electrical energy to suppose new geometric positions and the mechanical dimensions of
Objectives After completing this exercise, you should be able to : 1. Explain the significance of the labels of the bottles containing different chemicals, 2. Classify di
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Q. Write short notes on cloud and pour point of lubricant. Ans. Cloud and pour point of lubricant: When the temperature is lowered up to a particular point, the oil becomes
Give the properties and applications of Teflon. Teflon: This is acquired by the polymerisation of tetrafloourethylene. Properties: 1. This has good electrical, therma
Mass transfer coefficients can be of either local or overall type. a. Explain carefully what the local and overall mass transfer coefficients represent. b. How does the concentrati
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