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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
numericals based on kohlrausch law
Materials for AC applications These applications generally needs low coercivity Hc and low power loss, high permeability µ, high saturation magnetization. The low value of
Hard magnetic materials Permanent magnets are used as passive generators of magnetic field. To produce and maintain the magnetic field, a material should have both high resid
Vander Waal''s equation written in c language
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Defines the process battery limits for a plant to produce 500,000 tonnes per year of bioethanol. You should produce a process flow diagram of the plant and obtain literature capita
The functions of the oxide layer are to: 1. mask against diffusion or ion-implant 2. passivate the surface electrically and chemically 3. isolate one device from another
consider a system at 290k for which the enery of the nth state is En=n(0.01ev) using 1+a+a square+ a cube+...=1/(1-a), find the value of partition function.find the constant C in P
Why do we need to produce of Dimethyl ether? Today''s and future demands and supplies...Who are the consumers? (Consumer from industry and consumer''s habit).Safety precautions of
Advantages of cold working (i) No heat is needed. (ii) Better surface finish is get. (iii) Superior dimension control. (iv) Improved strength and hardness properti
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