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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
1. a) How are Polymers classified? b) Define polymerization. Differentiate addition and condensation polymerization. 2. a) Explain the free radical mechanism of addition p
Explain lattice energy The lattice energy of an ionic solid is calculates the strength of bonds in that ionic compound. It is given the symbol U and is equal to the amount o
Polarization of Dielectric If a material having polar molecules, they will usually be in random orientations when no electric field is applied. An applied electric field will p
how can be boiler trouble be minimised ?
in the combustion of heptane in oxygen CO2 was produced.if 500kg of dry ice was produced of which 50% of the CO2 was converted to dry ice,what is the amount of heptane needed to bu
#synthesis and uses of westron
Bakelite is a material based on the thermosetting phenol formaldehyde resin. Produced by the reaction under heat and pressure of phenol (a toxic, colourless crystalline solid) and
Explain the various steps required in the fabrication of an integrated circuit. Lithography: The method for pattern definition by applying thin uniform layer of viscous liqui
urea + formaldehyde
What is migration current in polarography?
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