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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
In the dryer air furnace, a natural gas containing 92.5 mole% methane, 4.8% ethane, and the remainder propane is burned with 20% excess air. The fuel enters the furnace at 25°C and
Defines the process battery limits for a plant to produce 500,000 tonnes per year of bioethanol. You should produce a process flow diagram of the plant and obtain literature capita
What is meant by crystal imperfections? Crystalline solids have a very regular atomic structure: that is, the local positions of atoms with respect to each other are frequent a
performance equation
Ask question #Minimum 100 words accepted.hardness of bore water is less than that of sea water-justify
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Distinguish between intrinsic and extrinsic semiconductor. In intrinsic semiconductors, the conduction is because of the intrinsic processes characteristics of the crystal, wit
understanding the concept of entrepreneurship and the process of innovation, come out with one assignment per group the used of materials in industry.
USES Sensors and devices based on Hall Effect are used for: 1 Analog multiplication 2 Current sensing 3 Position and motion sensing 4 Automotive ignition and fuel in
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