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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
What are the applications of polymers in electrical and electronics industries>
Refractoriness: It indicates the capacity of a material to withstand heat without appreciable deformation or softening under particular operating conditions and is measured as the
What is meant by crystal imperfections? Crystalline solids have a very regular atomic structure: that is, the local positions of atoms with respect to each other are frequent a
compare boron and aluminium with carbon and silicon
ACTIVITY 1 INVESTIGATION OF THE STORE Investigate the store of any one of the laboratories in your study centre and write a report in approximately 500 words. Procedure
structure of EDTA and estimation of hardness of water by Edta method
Salient properties of common semiconducting materials. The salient properties of semi-conducting materials are: These are the materials whose valence electrons are bound
what is complexometric titration?
Wet air containing 4.0 mole% water vapor at 76°F and 14.8 psia is passed through a column of calcium chloride pellets. The pellets absorb 97% of the water and none of the other con
Zinc has hcp structure. In a unit cell of zinc, the zinc atoms occupy 74% of volume of unit cell.
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