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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
Factors affecting on process design
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Objectives After performing this exercise you should be able to: 1. describe the design and organisation of a lab store, 2. suggest modifications in the store design,
The various types of polarization processes are: a) Electronic polarization b) Ionic Polarization c) Orientation Polarization, and d) Space charge Polarization
air flows through apipe at arte of 200L/S. The pipe of two sections of diameters 20cm and 10cm with asmoth reducing section the pressure are difference between the two pipe sectio
percent air
industrial applications-photochemistry
What is the aim of shear stress distribution?
why hard ness of bore well water is less than sea water? justify.
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