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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
PROCEDURE : Visit the preparation room of the lab (Physics/Chemistry/Zoology/I3otany), you studied in Exercise 1 and note its features. To make your study easy and to guide you, w
Contact Printing In contact printing, the resist-coated silicon wafer is bring into physical contact with the glass photo mask. The wafer is held on a vacuum chuck, and the ent
HOW CAN I BE ABLE TO CONTROL AND BALANCE THE INPUT AND OUT-PUT
Why terminsl alkynes is more acidic than internal alkynes?
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describe and explain the use of lime in neutralizing acids in soil for agricultural application
What kind of separation processes are there?
Q. Write short notes on cloud and pour point of lubricant. Ans. Cloud and pour point of lubricant: When the temperature is lowered up to a particular point, the oil becomes
explaination of weak acid vs weak base titration
The functions of the oxide layer are to: 1. mask against diffusion or ion-implant 2. passivate the surface electrically and chemically 3. isolate one device from another
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