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Ion implantation equipment typically having of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy, and a target chamber, where the ions impinge on a target, which is the material to be entrenched. Each ion is typically a single atom, and thus the actual amount of material implanted in the target is the integral over time of the ion current.
the pilling bedworth ratio of iron is 1.77 why it not stable as per rulr
Explain Sommerfeld theory Sommerfeld theory : The theory was originally proposed in 1900 to define and correlate the electrical and thermal properties of metals. Later, quantu
importance of chlorination in water
Define Cohesive energy Cohesive energy can be described as the difference among the average energy of the atoms of a solid (especially a crystal) and that of the free atoms.
Properties of good refractory material: The requirements of refractories for different furnaces and heating places depend on the working conditions. Nature of slag formed, maximum
How chemilcal#..
given the displacement vectors A(3^i-4^j+4^k)m and B(2^i+3^j-7k)m,find the magnitudes of the vectors (a)C=A+B and (b)D=2A-B,also expressing each in terms of its rectangular compone
equivalant weight ofmg(hco3)2
Requirements of boiler feed water
describe briefly any four internal conditioning methods
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