What will be the oxygen content of deposited al film

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Reference no: EM13253859

deposit Aluminum with a deposition rate of 100 nm/min. The substrate temperature is 300K. During the deposition, your chamber has an air leak that provides a residual O2 partial pressure of 10-6 Torr. Assuming a sticking coefficient of 1 for oxygen on Al, what will be the oxygen content of your deposited Al film in atomic %? Take the density of Al to be 6.02.1022 cm-3.

Reference no: EM13253859

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