Reference no: EM13236897
Question #1:
In the manufacture of integrated circuits, it is often necessary to coat silicon wafers with photoresist for later lithographic imaging. To learn more about a specific resist, an experiment was run to determine the effects of several factors on the photoresist coating process. The three most important factors were thought to be development time, prebake temperature, and post-exposure bake temperature. Based on current theories, the scientists thought that the single most important factor would be development time-this was thought to increase the Gamma value (explained below), but in a non-linear way. The second most important factor was expected to be pre-bake, and the third most important factor was thought to be post-exposure bake.
Three responses were measured:
- Gamma ("Gamma"). A measure of how fast the resist will clear. A higher gamma refers to a sharper image and this is desired. This is the most important response.
- Dose to clear ("DTC"). Amount of energy needed to expose the resist that will develop away cleanly. Minimum amount is desired. This is the second most important response.
- Thickness loss ("ThkLoss"). This is a loss of photoresist after development. Minimal loss is desired. This is third most important response.
The factors levels were
- Development time ("DevTime"). 37, 45 (standard), 53, and 61 seconds.
- Prebake temperature ("PreBake"). 100 (standard) and 110oC.
- Post-Exposure bake ("PEB"). 110 (standard) and 120oC.
All combinations were run twice. The experiment was run in a completely random order, over a one-day period. One wafer was used per run, so 32 wafers were used in all. The wafers were selected at random from a set of wafers that were available for the experiment. The wafer # is the same as the time order-for example, Wafer #1 was run first, and Wafer #32 was run last.
The Treatment Structure is:4x2x2 factorial
The Error-Control Structure is: Completely Randomized Design, with 2 replicates
The extended structure diagram is:
Where DT = DevTime, Fixed with 4 treat levels, Pr = PreBake, Fixed with 2 Treat levels, and PE = Post Bake, Fixed with 2 treat levels, and R = Wafers, Random Experimental Units
Q. Critique the error-control structure by explaining a simple way to create a better error-control structure (without using any additional resources). Show the structure diagram for this improved design. (Of course, the experiment was already run, so it is too late to change the design! What I want you to think about is how you would have improved the design while the design was still being created.)
Question #2:
If you run a 23treatment design in a Latin-Square type design with 14 people as the levels for the first blocking factor and 8 time points as the levels for the second blocking factor, (a) what is the natural model for this design and (b) how many d.f. are there for each term in the model?
|
Explain complexes are geometric isomers possible
: In which of the following complexes are geometric isomers possible, [Co(H2O)4Cl2]+, [Co(NH3)3F3], [Pt(NH3)Br3]-, [Co(en)2(NH3)Cl]2+, if isomers are possible draw their structures and label them as cis or trans
|
|
Explain a large sign that connot be moved or sold
: One of the partners favors moving downtown because she believes the additional business gained by moving downtown will exceed the higher rent at th downtown loaction plus the cost of making the move. THe other parnter at the PBS opposes the moves.
|
|
Determine how many security guards should the firm hire
: a) If each security guard is paid $200 a week and the cost of a stolen radio is $25, how many security guards should the firm hire b) If the cost of a stolen radio is $25, what is the most the firm would be willing to pay to hire the first secuirty ..
|
|
Explain how much more energy is released by the reaction
: C double bond O x2 for the first reaction and in the second reaction the CO has a tripple bond i've tried to do this several times and have gotten 166.5 kj/mol 81kj/mol and 48.5 kj/mol and all of them are wrong
|
|
What is the natural model for design
: What is the natural model for design and how many d.f. are there for each term in the model - design while the design was still being created.)
|
|
When an aggregate demand shock hits the economy
: Suppose the Reserve Bank of Australia (RBA) observes directly aggregate demand shocks or fully anticipates them. Formulate a monetary policy rule that would insulate the economy from aggregate demand shocks.
|
|
Find the force acting on the charge at the origin
: Three charges are fixed in the x-y plane as follows: 1.4nC at the origin (0, 0); 2.4nC at (0.90m , 0); -2.1nC nC at (0, 1.25m)
|
|
Why is it difficult to implement both policies at same time
: explain that investment can be increased both by reducing taxes on private savings and by reducing the government budget deficit A) Why is it difficult to implement both of these policies at the same time
|
|
Define what is the percentage of silicon in the mineral
: An emerald gemstone is an impure form of the mineral beryl, Be3Al2Si16O18. What is the percentage of silicon in the mineral
|