What are the theoretical resolution and depth-of-focus

Assignment Help Electrical Engineering

Reference no: EM13248510

1) Find the final yield for a nine-mask-level process in which the average fatal defect density per cm2 is 0.1 for four levels, 0.25 for four levels, and 1.0 for one level. The chip area is 50 mm2. Use Y = e-NDA (Note: N = of levels, D=average number of defects/unit area, A=area of chip)

2) An optical lithographic system has an exposure power of 0.3 mW/cm2. The required exposure energy for a positive photoresist is 140 mJ/cm2 and for a negative photoresist is 9 mJ/cm2. Assuming negligible times for loading and unloading wafers, compare the wafer throughput for positive photoresist and negative photoresist.

3) For an ArF-excimer laser 193 nm optical lithographic system with NA=0.65, k1=0.60, and k2=0.50, what are the theoretical resolution and depth-of-focus for this tool?

Reference no: EM13248510

Questions Cloud

Analyze the importance of the pre-solicitation notice : The Pre-Solicitation Notice: . Analyze the importance of the pre-solicitation notice to the success or failure of the contracting process. Speculate on the consequence of a contracting process without the employment of the pre-solicitation notice.

The techniques and tools that can be utilized to manage : Describe the techniques and tools that can be utilized to manage the data.

Design a second-order band-pass iir filter : Design a second-order band-pass IIR filter with center frequency of 450 Hz when the sampling frequency is 2000 Hz. In order to ensure the filter stability set the poles at 0.96 radial distant from the origin

Determine the distance between two objects at given time : Object A has a position as a function of time given by A(t) = (3.00 m/s)t + (1.00 m/s2)t2, What is the distance between object A and object B at time t = 4s?

What are the theoretical resolution and depth-of-focus : The required exposure energy for a positive photoresist is 140 mJ/cm2 and for a negative photoresist is 9 mJ/cm2. Assuming negligible times for loading and unloading wafers, compare the wafer throughput for positive photoresist and negative photor..

Define the electron-dot formula : Draw the electron-dot formula for each of the following: a) H3COCH3 (the atoms are in the order C O C); b) CS2 (the atoms are in the order S C S); c) CLO2^-; d) SF3^+; e) H2CCHCN (the atoms are in the order C C C).

Find the induced emf in the entire solenoid : A solenoid of length 5.4 cm and diameter 0.92 cm is wound with 167 turns per cm, What is the induced emf in the entire solenoid

Inception to current-day operations : Two to three (2-3) companies for you to choose from for this assignment. Using the Internet and Strayer University databases, research the selected company from its inception to current-day operations.

Find what is the themal efficiency of the engine : If the work output is 10kW, find the required heat transfer rate from the high to the low temperature source, and the required heat transfer rate to the low temperature source. What is the themal efficiency of the engine

User Account

All Pages