To determine the mass-transfer coefficient of chlorine in

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Reference no: EM13622994

Silicon tetrachloride, SiCl4, is a key chemical in the silicon chemical vapor deposition. It is used in the production of silane, SiH4. The purity of SiCl4 is essential to the production of high-quality silicon films. To eliminate trichlorosilane, SiHCl3, within the high-purity silicon tetrachloride, chlorine gas is bubbled through the liquid SiCl4

at 298 K to promote the following reaction:

SiHCl3 + Cl2 = SiCl4 + HCl

The HCl is then easily removed in a stripper, using nitrogen as the stripping gas.

To determine the mass-transfer coefficient of chlorine in liquid SiCl4, a Schmidt number is needed. Evaluate the Schmidt number for chlorine in liquid silicon tetrachloride at 298 K. Following information is available for SiCl4 at 298 K:

density = 1.47 gm/cm^3 mew = 5.2*10^-4

The diffusivity for chlorine in silicon tetrachloride can be evaluated using the Wilke-Chang equation.

Reference no: EM13622994

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