Produced on a screen from light flashed on a two-slit mask

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Reference no: EM13561816

Originally a pattern in produced on a screen from light flashed on a two-slit mask. The center of the screen is C and is originally a spot of maximum constructive interference. Spot Z is the next spot of maximum constructive interference. Spot X is the last part of the screen and is a point of zero intensity. If this is changed to a five-slit mask system, will spots C, X, and Z still be same as original system?

Reference no: EM13561816

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