Problem regarding the thickness of photoresist

Reference no: EM13995199

The thickness of photoresist applied to wafers in semiconductor manufacturing at a particular location on the wafer is uniformly distributed between 0.2050 and 0.2150 micrometers.

Reference no: EM13995199

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Problem regarding the thickness of photoresist : The thickness of photoresist applied to wafers in semiconductor manufacturing at a particular location on the wafer is uniformly distributed between 0.2050 and 0.2150 micrometers.

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