Find impurity concentrations necessary to dope polysilicon

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Reference no: EM131321122

Find the impurity concentrations necessary to dope the polysilicon gate so that the surface is flat-banded. V_S=0, intrinsic, V_S=V_F, and at the threshold, V_S=2V_F.

The last is known as the zero threshold device but a more correct design is V_S = V_F.

Reference no: EM131321122

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