Explain what may be going on by adding chemical

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It is found that a certain plasma etch chemistry in a certain RIE etch system pro-duces vertical sidewalls with zero etch bias when etching a particular film.

Adding chemical A to the etch chemistry results in nonvertical sidewalls. and an etch bias.

Adding chemical B to the original etch chemistry results in non vertical sidewalls, but with zero etch bias. Explain what may be going on.

Reference no: EM131794289

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