Explain how an intrinsic semiconductor can be doped

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Reference no: EM132110828

1. Describe and explain how electrical charge is carried through

(a) a good conductor

(b) an insulator

(c) intrinsic semiconductor.

Your answer should include the name and polarity of the charge carriers involved.

2. Explain how an intrinsic semiconductor can be doped to become a p-type or n-type material. Describe and explain the movement of electrical charge through p-type and n-type semiconductors. Mention all charge carriers and their relative contribution to the conduction process.

3. For each of the following semiconductor devices describe its structure and electrical operation:

Devices:

- diode

- field effect transistor

- bipolar transistor.

4. FIGURE 1 shows a semiconductor resistor formed by a p-type diffusion into an n-type background. The resulting p-type material was found to have a sheet resistance of 100 Ω.

43_semiconductor.jpg

Fig. 1

Estimate:

(a) the resistance of the resistor

(b) the required depth of the p-type diffusion if the p-type layer has a resistivity of 2 × 10-4 Ωm.

5. Explain what is meant by a MOSFET's threshold voltage and describe a method by which it could be measured.

Verified Expert

This assignment discusses the flow of electrical current / charge through conductor, insulator and semiconducting material, Formation of N / P type semiconductors by doping intrinsic semiconductors, Structure and electrical operation of semiconductor devices like diode, FET and BJT. It also explains calculation of resistance & diffusion layer depth calculation for a given semiconductor, MOSFET threshold voltage measurement and CMOS fabrication steps.

Reference no: EM132110828

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urv2110828

11/16/2018 10:30:46 PM

I made a very good grade on both assignments. Sources are well- chosen, authoritative and are appropriate for the task. Excellent understanding. The research is very well integrated with the main text. Thank you very much, appreciated. You are really so much supportive.

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