Reference no: EM132990294
Question 1: Using estimate the small-signal channel resistance (the change in the drain current with changes in the drain-source voltage) of a MOSFET operating in the triode region (the resistance. between the drain and source).
ID = β.[(VGS - VTHIN) VDS - V2DS/2]
Question 2: Show that the bottom MOSFET. in a series connection of two MOSFETs cannot operate in the saturation region. Neglect the body effect. Hint: Show that Mi is always either in cutoff (VGS1 < VTHN) or triode ( VDS1 < VGS1 - VTHN),
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Question 3: On a CV plot, like the one seen in. Fig. explain in your own words and with cross-sectional views why operation in the strong inversion region results in a better NIOSCAP than operation in the accumulation region. If you wanted to use the MOSFET as a cap in accumulation what would you do in Your layout to make it a better cap?
Question 4: Sketch, for an NMOS device, ID against VDS with VGS = VDD. Indicate, on your sketch, Ion, ID,sat, and VDS.sat
Question 5: How does the subthreshold slope change with temperature? Is it desirable to have large or small subthreshold slope (units of mV/dec)?