Draw a graph to represent the results

Reference no: EM131436855

Manufacturing and Product Development

Microlithography is a process that includes baking a semiconductor wafer. An experiment was conducted to study the temperature of a 200-mm-diameter wafer at different locations on the wafer during a new baking process. Independent random samples of wafers were selected, and a temperature sensor was placed on each wafer at one of four distances from the center of the wafer. The temperature was recorded (in °C) 80 seconds into the process. The summary statistics are given in the following table.

Location	T1	T2	T3	T4
Sample size	10	10	10	10
Sample mean	106.7	104.6	104.3	98.6

A one-way analysis of variance test was significant at the p = 0.009 level. Use MSE = 26.92 to find the Bonferroni 95% confidence intervals for all pairwise differences. Draw a graph to represent the results.

Reference no: EM131436855

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