Determine the doping concentration for threshold voltage

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Reference no: EM13278300

Consider a MOS device with the following parameters: Aluminum gate, p- type silicon substrate, oxide thickness of 20nm, and surface fixed oxide charge of 4x1010 cm-2
(a) Determine the doping concentration such that the threshold voltage is 0.5V.
(b) Determine the resistivity of the substrate.
(c) Calculate the oxide electric field.

Reference no: EM13278300

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