Design a mask set and process flow

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Reference no: EM13707446

Design a mask set and process flow that would produce a 50000 Ohm resistor patterned onto the surface of an initially n type silicon wafer (0.18 Ohm-cm, phosphorous doped). Include metallization pads in your mask design. Use a two step predeposition/drive in technique to make the resistor.

Reference no: EM13707446

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