Con?dence interval on mean photoresist thickness

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A new process has been developed for applying photoresist to 125-mm silicon wafers used in manufacturing integrated circuits. Ten wafers were tested, and the following photoresist thickness measurements (in angstroms X 1000) were observed: 13.3987, 13.3957, 13.3902, 13.4015, 13.4001 , 13.3918, 13.3965, 13.3925, 13.3946, and 13.4002. (For your convenience, we have calculated sample mean: 13.4 and sample standard deviation: 0.0039. You can use them directly.) (a) Test the hypothesis that mean thickness is 13.4 X 1000 A. Use or. = 0.2 and assume a two- sided alternative. (b) Find a 90% two-sided con?dence interval on mean photoresist thickness. Assume that thickness is normally distributed.

Reference no: EM133245854

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