Calculate the thickness of the sio2 film

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Reference no: EM131297624

A thin film of silicon dioxide covers a silicon wafer. Plane light waves of variable wavelengths are incident normal to the film. When one views the reflected wave, it is noted that complete destructive interference occurs at 600 nm and constructive interference occurs at 700 nm. Calculate the thickness of the SiO₂ film.

Reference no: EM131297624

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