Calculate the rate of sputtering of al

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Reference no: EM133791840

Problem

Sputtering Rate Consider Al deposition by RF sputtering. For a symmetrical, parallel plate system, the applied voltage is 120eV, and the electrode area is 20 cm2 . For Al, the sputtering yield, S, is given by SAl (atom/ion)=2.257(E1/2 -0.0131/2 ), where E is in the units of keV. Assume that the root mean square current is 0.08A. (i) Calculate the rate of sputtering of Al. (ii) How do you expect the deposition rate on the substrate to compare to the rate of sputtering?

Reference no: EM133791840

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