Calculate the change in junction depth for a 40-key boron

Reference no: EM131793919

Calculate the change in junction depth for a 40-key boron threshold adjust implant of 5 x 10¹³ cm^-2 annealed at 750°C in a furnace or at 1000°C in an RTA for a time just long enough to remove all the damage that causes TED.

Assume a uniform well doping of 5 X 10¹⁶ cm^-3.

Reference no: EM131793919

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