Atomic layer deposition process

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Reference no: EM13947527

A nanolaminated material is fabricated with an atomic layer deposition process, resulting in a series of protecting the heat-generating devices to which they are attached by conducting thermal energy away from the devices to surrounding, cooler regions. Consider a thin film of gold that has a cross section of 60 nm X 250 nm.

(a) For an applied temperature difference of 20°C, determine the energy conducted along a 1-µ,m- long, thin-film interconnect. Evaluate properties at 300 K.

(b) Plot the lengthwise (in the 1-µ,m direction) and spanwise (in the thinnest direction) thermal con- ductivities of the gold film as a function of the film thickness L for 30 L 140 nm.

Reference no: EM13947527

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